Photomask and fabrication of the same

Details Photomask and fabrication of the same Photomask and fabrication of the same

1991-05-24

1992-09-15

McCamish, Marion E.

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

430 9, 430 13, 430292, G03F 100

Patent

active

051477424

ABSTRACT:
A photomask for an ultraviolet light with a contrast of 10 or larger can be fabricated by generating a color center by irradiating a calcium fluoride crystal substrate with a KrF excimer laser (wavelength of 248 nm) with an energy of 10 J/cm.sup.2 through an original photomask formed by a chromium film on a quartz substrate and forming a pattern by a color center corresponding to an original photomask pattern. In the same way, a similar photomask can be fabricated by irradiating a calcium fluoride crystal substrate with X-rays having a wavelength ranging from 0.5 to 1.0 nm through an original mask formed by a gold film on the silicon substrate.

REFERENCES:
patent: 3512969 (1970-05-01), Robillard
patent: 3580688 (1971-05-01), Schneider
patent: 3909270 (1975-09-01), Kishi et al.
patent: 4670366 (1987-06-01), Wu
patent: 4894303 (1990-01-01), Wu
Chemical Abstracts, vol. 87, No. 10, Sep. 5, 1977, Ref. No. 76338H, Gargarin et al.

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