Photomask and exposure method for large scaled LCD device

Details Photomask and exposure method for large scaled LCD device Photomask and exposure method for large scaled LCD device

2005-08-16

2005-08-16

Rosasco, S. (Department: 1756)

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

C430S022000

Reexamination Certificate

active

06929888

ABSTRACT:
A photolithography process and its enabling photomask that is suitable for fabricating large substrates. The photomask is comprised of a transparent substrate, a pattern on that transparent substrate, a plurality of main mask keys on side edges of the transparent substrate, and a plurality of auxiliary mask keys, each spaced apart from a corresponding main mask key. To expose a substrate, the photomask is sequentially aligned with plate keys on the substrate using the main mask keys and then the auxiliary mask keys. Alternatively, the substrate includes a plurality of main plate keys and auxiliary plate keys and the photomask includes a plurality of mask keys. To expose the substrate, the photomask is sequentially aligned with the main plate keys and then the auxiliary plate keys by using the mask keys.

REFERENCES:
patent: 5017514 (1991-05-01), Nishimoto
patent: 5407763 (1995-04-01), Pai
patent: 5580829 (1996-12-01), Browning et al.
patent: 6281024 (2001-08-01), Yoshitake

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