Photomask and exposure method

Details Photomask and exposure method Photomask and exposure method

2007-05-18

2011-11-29

Huff, Mark F (Department: 1721)

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

C430S311000

Reexamination Certificate

active

08067132

ABSTRACT:
To provide a photomask capable of preventing a foreign matter generation in using the photomask, and an exposure method using this photomask. The photomask includes a transparent substrate2; a transfer pattern4formed in a main region3of a center portion of the transparent substrate2; a light-shading band region5provided adjacent to the main region3in the outer peripheral region of the main region3; and a pellicle6formed by adhering a pellicle film6ato a pellicle frame6bby an adhesive8a, wherein this pellicle6is adhered onto a light-shading region7consisting of a light-shading film formed in the outer peripheral region of the main region3, through an adhesive8b.

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Korean Office Action corresponding to Korean Patent Application No. 10-2007-0048603 dated Dec. 14, 2010.
Japanese Office Action from corresponding Japanese Patent Application No. 2006-139573 dated Jul. 5, 2011.

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