Radiation imagery chemistry: process – composition – or product th – Radiation modifying product or process of making – Radiation mask
Patent
1996-03-21
1998-06-16
Rosasco, S.
Radiation imagery chemistry: process, composition, or product th
Radiation modifying product or process of making
Radiation mask
430296, 430311, G03F 900
Patent
active
057668027
ABSTRACT:
In accordance with the invention, a mask is produced of high quality and accuracy. This is accomplished by reducing the nominal writing scan width, relative to the total scan width, in an electron or optical beam raster scan pattern generator, and overlapping the adjacent scans by the difference between the writing scan width and the total scan width. When a pattern feature of small size overlaps into adjacent scan areas, the width of the writing scan is increased so the pattern area is within the increased writing scan area. In the case of a large pattern area with only a small portion extending into the adjacent scan area, no increase in the writing scan length is made.
REFERENCES:
patent: 4523098 (1985-06-01), Noma
patent: 5030836 (1991-07-01), Kusui et al.
Laughlin, Esq. Richard T.
Rosasco S.
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