Photomask

Details Photomask Photomask

1990-12-14

1993-06-15

McCamish, Marion E.

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

430311, G03F 900

Patent

active

052196860

ABSTRACT:
A photomask comprises a light blocking portion and at least one of first and second light transmitting portions adjacent to the light blocking portion. The first light transmitting portion is provided on opposite ends thereof with phase shifters for shifting the phase of a transmitted light by 1/2 wavelength, while the second light transmitting portion is provided in the center thereof with the phase shifter. Thus, light transmitted by ends of the first and second light transmitting portions cancel light refracted from centers thereof, so that an edge of an optical image of the photomask can be kept steep.

REFERENCES:
patent: 4764441 (1988-08-01), Ohta et al.
patent: 4777116 (1988-10-01), Kawatsuki et al.
patent: 5045417 (1991-09-01), Okamoto
WPAT Abstract 83-790097/42, Levenson, Image Resolution of Photolithographic Transmission Mask in, 1983.

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