Photomask

Details Photomask Photomask

2009-06-29

2011-11-01

Rosasco, Stephen (Department: 1721)

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

Reexamination Certificate

active

08048592

ABSTRACT:
A photomask that includes an assistant pattern is provided. The photomask comprises a target pattern transcribed over a wafer by an exposing process, and an assistant pattern formed symmetrically with a main pattern of the target pattern based on the outer pattern of the target pattern, thereby minimizing the loss of the outer pattern and maximizing the process margin in the defocus environment.

REFERENCES:
patent: 7214453 (2007-05-01), Yamazoe et al.
patent: 2006/0078806 (2006-04-01), Hansen
patent: 07-146545 (1995-06-01), None
patent: 1020040070801 (2004-08-01), None

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