Photomask

Details Photomask Photomask

1980-03-05

1983-01-11

Lesmes, George F.

Stock material or miscellaneous articles

Structurally defined web or sheet

Discontinuous or differential coating, impregnation or bond

427165, 427269, 427109, 427 74, 428432, 428469, 428433, 428434, 428457, 428209, 428210, B32B 300

Patent

active

043682308

ABSTRACT:
A photomask comprises a transparent film of conductive material and a light shielding film of predetermined pattern on a transparent substrate. The pattern film is made of a metallic element having its atomic number not smaller than 25 or a composition containing the metallic element. The photomask structure is suited to the case where the pattern formed on the mask is inspected with an electron beam. With the mask structure, the contrast of a pattern related information signal (backscattered electrons, secondary electrons, absorption current, etc.) derived from the mask upon irradiation thereof with the electron beam is improved.

REFERENCES:
patent: 3898359 (1975-08-01), Nadkarni
patent: 3916056 (1975-10-01), Feldstein
patent: 4000346 (1976-12-01), Dowell
patent: 4006070 (1977-02-01), King
patent: 4200473 (1980-04-01), Carlson
patent: 4256778 (1981-03-01), Mizukami et al.

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