Photomask

Details Photomask Photomask

2008-01-29

2008-01-29

Rosasco, S. (Department: 1756)

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

Reexamination Certificate

active

07323277

ABSTRACT:
A photomask is proposed which comprises a transparent substrate and a light shielding film formed on a principal surface of the substrate, with the light shielding film having an aperture pattern thereon. And, a recess is provided at the portion of the transparent substrate which is exposed in the bottom of the aperture pattern. The dimension of the recess is larger than that of the aperture, and a peripheral portion of each of the aperture pattern of the light shielding film is configured as an eaves-like extension in response to the density of a neighboring pattern of the aperture pattern.

REFERENCES:
patent: 6713231 (2004-03-01), Hasegawa et al.

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