Photomask

Details Photomask Photomask

2011-08-30

2011-08-30

Huff, Mark F (Department: 1721)

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

Reexamination Certificate

active

08007962

ABSTRACT:
A photomask includes a base, a plurality of chip pattern regions over which a light shielding pattern of a metal material is defined, the plurality of chip pattern regions being defined on the base, scribe regions defined between the chip pattern regions, the scribe regions being defined by using the light shielding pattern, and slits in which the light shielding pattern is not defined, the slits being defined so as to surround the chip pattern regions.

REFERENCES:
patent: 7419748 (2008-09-01), Ahn
patent: 2007/0057349 (2007-03-01), Yang
patent: 2010/0112462 (2010-05-01), Rolfson
patent: 03-121456 (1991-05-01), None
patent: 05-019448 (1993-01-01), None

Affiliated with

Also associated with

Rating

Photomask does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Photomask, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Photomask will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-2703851