Photomask

Photocopying – Contact printing – Frames

Patent

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Details

430 5, G03B 2728

Patent

active

044152620

ABSTRACT:
A photomask is disclosed which is suitable for use in the one-mask method capable of forming a plurality of patterns with one exposure, and in which an opaque pattern having a predetermined form and a semi-transparent pattern having another predetermined form are formed on a transparent substrate, and the semi-transparent pattern is formed of an opaque film having a large number of fine through holes.

REFERENCES:
patent: 3403024 (1968-09-01), Luce
patent: 3476658 (1969-11-01), Corwin

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