Radiation imagery chemistry: process – composition – or product th – Radiation modifying product or process of making – Radiation mask
Reexamination Certificate
2005-02-22
2009-02-24
Chu, John S (Department: 1795)
Radiation imagery chemistry: process, composition, or product th
Radiation modifying product or process of making
Radiation mask
C430S313000, C430S323000, C430S329000, C430S330000, C430S394000
Reexamination Certificate
active
07494749
ABSTRACT:
The invention, in its various aspects, is an interdependent binary photomask for use in a photolithography operation in a semiconductor fabrication process, a method for fabricating these interdependent photomasks, and a method of using the same. The photomask comprises a first binary reticle and a second binary reticle. Each binary reticle includes a pattern formed on a plate, but the pattern formed on one plate is interdependent with the pattern formed on the other plate so that the reticles are used in tandem to transfer the pattern onto wafers having features residing in different focal planes. The method of fabricating the interdependent binary photomask consequently includes specifying a first and a second portion of a circuit layout, the first and second circuit portions being interdependent. The first and second portions are digitized and used to form first and second interdependent patterns on separate reticles. In use, the first reticle is aligned with a portion of a wafer and the wafer portion is then exposed. The second reticle is then aligned with the same wafer portion and the wafer portion exposed.
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Liegl et al., “Lithography Process Cost Considerations for 130 nm Groundrules,”Arch Microlithography Symposium(Arch Chemicals, Inc. Interface '99), pp. 217-223 (Nov. 14-16, 1999).
Advanced Micro Devices , Inc.
Chu John S
Williams Morgan & Amerson P.C.
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