Stock material or miscellaneous articles – Structurally defined web or sheet – Discontinuous or differential coating – impregnation or bond
Patent
1994-08-19
1995-12-05
Ryan, Patrick J.
Stock material or miscellaneous articles
Structurally defined web or sheet
Discontinuous or differential coating, impregnation or bond
428210, 428901, 428195, B32B 900
Patent
active
054727740
ABSTRACT:
A photolithography test structure is provided for measuring the amount of notching associated with photolithography processing. The test structure includes a curved insulating structure placed in close spaced proximity with a conductive, interconnect structure. A pair of conductive pads are deposited at opposite ends of the interconnect structure for measuring the resistance through the interconnect. Depending upon the amount of notching associated with the interconnect, resistance readings will vary. Test areas containing notched interconnect can be compared with controlled areas specifically designed not to have notching in order to determine relative changes in resistance, and to correlate that resistance with notching magnitude. The insulating structure, interconnect structure and conductive pads are processed upon the same substrate material containing the resulting product requiring testing.
REFERENCES:
patent: 4144493 (1979-03-01), Lee
patent: 4302498 (1981-11-01), Faith, Jr.
patent: 4336295 (1982-06-01), Smith
patent: 4654269 (1987-03-01), Lehrer
patent: 4732801 (1988-03-01), Joshi
patent: 4899439 (1990-02-01), Potter et al.
patent: 5218211 (1993-06-01), Cresswell
patent: 5231043 (1993-07-01), Chan
Chapman William C.
Goad Howard S.
Hillis Michael A.
Hussey, Jr. James H.
Wristers Derick J.
Advanced Micro Devices
Daffer Kevin L.
Jewik Patrick
Ryan Patrick J.
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