Photolithography test structure

Details Photolithography test structure Photolithography test structure

1993-02-26

1994-12-06

Ryan, Patrick J.

Stock material or miscellaneous articles

Structurally defined web or sheet

Discontinuous or differential coating, impregnation or bond

428901, 250332, 250352, 156633, B32B 900

Patent

active

053709233

ABSTRACT:
A photolithography test structure is provided for measuring the amount of notching associated with photolithography processing. The test structure includes a curved insulating structure placed in close spaced proximity with a conductive, interconnect structure. A pair of conductive pads are deposited at opposite ends of the interconnect structure for measuring the resistance through the interconnect. Depending upon the amount of notching associated with the interconnect, resistance readings will vary. Test areas containing notched interconnect can be compared with controlled areas specifically designed not to have notching in order to determine relative changes in resistance, and to correlate that resistance with notching magnitude. The insulating structure, interconnect structure and conductive pads are processed upon the same substrate material containing the resulting product requiring testing.

REFERENCES:
patent: 4302498 (1981-11-01), Faith, Jr.
patent: 4336295 (1982-06-01), Smith
patent: 4654269 (1987-03-01), Lebrer
patent: 4732801 (1988-03-01), Joshi
patent: 4899439 (1990-02-01), Potter et al.

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