Photolithography system having multiple adjustable light...

Details Photolithography system having multiple adjustable light... Photolithography system having multiple adjustable light...

2006-03-14

2006-03-14

Luu, Thanh X. (Department: 2878)

Radiant energy

Photocells; circuits and apparatus

Photocell controls its own optical systems

Reexamination Certificate

active

07012270

ABSTRACT:
The invention relates to a device for photolithography of integrated circuits, at least comprising base plate, precision working table, optical head array; the optical head array adopts a line-array photosource scan-imaging device to realize the optical probe technique, and the line-array photosource scan-imaging device comprises a line-array photosource consisting of a plurality of adjacent linearly-arranged micro-photosources and the micro-imaging system performing micro-imaging for the photosource; the line-array photosource can realized not only with a plurality of micro-lasers but also with a line-array photosource device; a novel method is disclosed that can perform encoding based upon the line-array photosource scan width; an integrated circuit photolithographic method which can align the silicon wafer not only at the beginning of photolithography but also can repeatedly align it if needed during the photolithographic process.

REFERENCES:
patent: 5343271 (1994-08-01), Morishige
patent: 5581075 (1996-12-01), Naraki et al.
patent: 6002466 (1999-12-01), Brauch et al.
patent: 6233039 (2001-05-01), Yen et al.
patent: 6536966 (2003-03-01), Butler
P.F. Carcia et al., Thin Film for Phase-shift Masks, Vacuum and Thim Film, HIS Publishing Group, Sep. 14-21, 1999.

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