Photolithography system and method of monitoring the same

Details Photolithography system and method of monitoring the same Photolithography system and method of monitoring the same

2007-01-09

2007-01-09

Rutledge, D. (Department: 2851)

Photocopying

Projection printing and copying cameras

Illumination systems or details

C355S069000, C355S077000

Reexamination Certificate

active

11017783

ABSTRACT:
A management system and method of a reticle in an exposing process are disclosed. A calculator calculates an accumulated dosage of an illuminating light irradiated onto a reticle used in a photolithography process. The calculator is connected to an exposing apparatus to expose photoresist on a semiconductor substrate. A comparator compares the calculated accumulated dosage with a preset reference dosage. When the calculated accumulated dosage is greater than or equal to the reference dosage, a controller suspends the photolithography process. Minimizing haze contamination on the reticle, thus preventing process failures.

REFERENCES:
patent: 6538719 (2003-03-01), Takahashi et al.
patent: 0 458 539 (1991-11-01), None
patent: 5326359 (1993-12-01), None
patent: 06-084869 (1994-03-01), None
patent: 2002-353109 (2002-12-01), None
patent: 10-0190026 (1999-01-01), None

Affiliated with

Also associated with

Rating

Photolithography system and method of monitoring the same does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Photolithography system and method of monitoring the same, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Photolithography system and method of monitoring the same will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-3741612