Photolithography method using coherence distance control

Details Photolithography method using coherence distance control Photolithography method using coherence distance control

1997-10-31

1999-08-31

Metjahic, Safet

Photocopying

Projection printing and copying cameras

Illumination systems or details

355 53, G03B 2754, G03B 2742

Patent

active

059460792

ABSTRACT:
A method for mapping coherence and a method and system for reducing varying coherence conditions of a stepper field exposure tool used in lithographic patterning. The present invention describes a method and system to reduce the effective light source of a stepper field exposure tool in order to decrease the variance of coherence conditions across a stepper field. The decrease in variance of coherence conditions across the stepper field corrects for a wide range of linewidth variation in lithographic patterning.

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