Photolithography method using coherence distance control

Details Photolithography method using coherence distance control Photolithography method using coherence distance control

1995-06-30

1998-09-01

Evans, F. L.

Optics: measuring and testing

Lens or reflective image former testing

For optical transfer function

G01B 900

Patent

active

058018212

ABSTRACT:
A method for mapping coherence and a method and system for reducing varying coherence conditions of a stepper field exposure tool used in lithographic patterning. The present invention describes a method and system to reduce the effective light source of a stepper field exposure tool in order to decrease the variance of coherence conditions across a stepper field. The decrease in variance of coherence conditions across the stepper field corrects for a wide range of linewidth variation in lithographic patterning.

REFERENCES:
patent: 5597667 (1997-01-01), Nakao

Affiliated with

Also associated with

Rating

Photolithography method using coherence distance control does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Photolithography method using coherence distance control, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Photolithography method using coherence distance control will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-275558