Radiation imagery chemistry: process – composition – or product th – Radiation modifying product or process of making – Radiation mask
Patent
1996-05-28
1998-01-13
Rosasco, S.
Radiation imagery chemistry: process, composition, or product th
Radiation modifying product or process of making
Radiation mask
430296, 430313, G03F 900
Patent
active
057077657
ABSTRACT:
There is disclosed a photolithography mask and method of making the same that utilizes serifs to increase the correspondence between an actual circuit design and the final circuit pattern on a semiconductor wafer. The mask uses a plurality of serifs having a size determined by a resolution limit of the optical exposure tool used during the fabrication process. The serifs are positioned on the corner regions of the mask such that a portion of surface area for each of the serifs overlaps the corner regions of the mask. The size of the serifs is about one-third the resolution limit of said optical exposure tool. About 33 to about 40 percent of the total surface area of the serifs overlap the corner regions of the mask.
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MicroUnity Systems Engineering, Inc.
Rosasco S.
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