Photolithographic technique and illuminator using real-time addr

Optical: systems and elements – Optical modulator – Light wave temporal modulation

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359254, 359315, 359316, 359245, 359295, 372 27, G02F 109

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active

055395678

ABSTRACT:
A phase shift illuminator (700) is comprised of a light source (704) and a phase modulator (716), typically a flexure beam micromirror array, which transversely modulates the incident light beam. When a flexure beam micromirror array is used as the phase modulator (716) a polarizing beam splitter (712) and a quarter-wave plate (714) are used to separate the incident and reflected light beams. The phase modulated light beam (720) from the optical illuminator may be used in optical lithography by passing the light beam through a lithography mask (724), typically after the light beam is phase modulated, and focusing the light beam onto a target wafer (726).

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