Photolithographic reduction imaging of extended field

Details Photolithographic reduction imaging of extended field Photolithographic reduction imaging of extended field

1992-09-04

1994-01-25

Wintercorn, Richard A.

Photocopying

Projection printing and copying cameras

Methods

355 53, G03B 2742, G03B 2732

Patent

active

052819965

ABSTRACT:
A mask or reticle for a single large microcircuit device is imaged in portions by an axially centered photolithographic reduction lens having a movable mask stage in addition to a movable wafer stage so that the portions of the complete device are imaged in juxtaposed registry on the wafer. This allows a single microcircuit device larger than the image field of the reduction lens to be imaged in a scanning mode or in a succession of steps forming images at the desired resolution range of 0.1-0.50 .mu.m.

REFERENCES:
patent: 4864360 (1989-09-01), Isohata et al.
patent: 4869998 (1989-09-01), Eccles et al.
patent: 4878086 (1989-10-01), Isohata et al.
patent: 4924257 (1990-05-01), Jain
patent: 4933714 (1990-06-01), Buckley et al.
patent: 5160957 (1992-11-01), Ina et al.
"Optical Imaging for Microfabrication", by J. H. Bruning, J. Vac. Sci. Technol., 17(5), Sep./Oct. 1980, pp. 1147-1155.
"Stepand Scan: A Systems Overview of a New Lithography Tool", by J. D. Buckley and C. Karatzas, SPIE vol. 1088, Optical/Laser Micro lithography II (1989), pp. 424-433.

Affiliated with

Also associated with

Rating

Photolithographic reduction imaging of extended field does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Photolithographic reduction imaging of extended field, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Photolithographic reduction imaging of extended field will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-731405