Photolithographic process for fabricating thin film transistors

Details Photolithographic process for fabricating thin film transistors Photolithographic process for fabricating thin film transistors

1982-08-23

1984-07-24

Hearn, Brian E.

Metal working

Method of mechanical manufacture

Assembling or joining

29576J, 29578, 148 15, 357 4, H01L 2131

Patent

active

044610718

ABSTRACT:
A photolithographic method for fabricating thin film transistors and thin film transistor arrays in which the contamination vulnerable semiconductor-insulator interfaces are formed in a single vacuum pump-down operation. To minimize step coverage problems, quasi-planar construction is employed to provide a planar substructure for receipt of the deposited thin semiconductor layer.

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