Photolithographic patterning of polymeric materials

Details Photolithographic patterning of polymeric materials Photolithographic patterning of polymeric materials

2011-04-12

2011-04-12

Kornakov, Michael (Department: 1714)

Coating processes

With post-treatment of coating or coating material

Swelling agent or solvent applied to treat coating

C427S489000, C427S532000, C427S553000, C428S412000, C430S271100, C430S273100, C430S306000, C522S001000

Reexamination Certificate

active

07923071

ABSTRACT:
The invention comprises methods for the photolithographic patterning of features in a photo-curable polymer composition coated onto a plastic substrate. In one embodiment of this invention, the plastic substrate is coated with a reflective film such as a metallic barrier. In another embodiment, the plastic substrate is coated or co-extruded with a polymer barrier layer containing an additive that absorbs the photo-curing radiation. In yet another embodiment the plastic substrate contains an intrinsic additive that absorbs the photo-curing radiation. Combinations of these embodiments are also within the scope of this invention.The methods of the present invention may be advantageously applied to the fabrication of optical waveguides comprising a photo-curable polymer supported on a plastic substrate, but are applicable to the fabrication of any device or object comprising a photo-curable polymer supported on a plastic substrate.

REFERENCES:
patent: 3689264 (1972-09-01), Chandross
patent: 3809732 (1974-05-01), Chandross
patent: 3949114 (1976-04-01), Viola et al.
patent: 3993485 (1976-11-01), Chandross
patent: 4126466 (1978-11-01), Roos
patent: 4609252 (1986-09-01), Wong
patent: 4645731 (1987-02-01), Bayless et al.
patent: 4838634 (1989-06-01), Bennion et al.
patent: 5054872 (1991-10-01), Fan
patent: 5104771 (1992-04-01), Murray
patent: 5235541 (1993-08-01), Edme et al.
patent: 5402514 (1995-03-01), Booth
patent: 5462700 (1995-10-01), Beeson
patent: 5497445 (1996-03-01), Imoto
patent: 5789015 (1998-08-01), Gupta et al.
patent: 5914709 (1999-06-01), Graham
patent: 5985084 (1999-11-01), Summersgill
patent: 6002828 (1999-12-01), Hult
patent: 6054253 (2000-04-01), Fardad
patent: 6114090 (2000-09-01), Wu
patent: 6133472 (2000-10-01), Nalewajek
patent: 6162579 (2000-12-01), Stengel
patent: 6181842 (2001-01-01), Francis
patent: 6306563 (2001-10-01), Xu
patent: 6351260 (2002-02-01), Graham
patent: 6413699 (2002-07-01), Kanga
patent: 6429587 (2002-08-01), Sugimachi et al.
patent: 6500887 (2002-12-01), Tobita et al.
patent: 6512874 (2003-01-01), Xu
patent: 6537723 (2003-03-01), Toyoda
patent: 6542684 (2003-04-01), Eldada
patent: 6599957 (2003-07-01), Dawes
patent: 6632585 (2003-10-01), Nakamura
patent: 6709607 (2004-03-01), Hibbs-Brenner
patent: 6724968 (2004-04-01), Lackritz
patent: 6727337 (2004-04-01), Friedrich
patent: 6731857 (2004-05-01), Shelnut
patent: 6800724 (2004-10-01), Zha
patent: 6804445 (2004-10-01), Edlinger
patent: 6818721 (2004-11-01), Zha
patent: 6832036 (2004-12-01), Ghoshal et al.
patent: 6918666 (2005-07-01), Sekiya
patent: 6965006 (2005-11-01), Zha
patent: 7261931 (2007-08-01), Nishikawa et al.
patent: 7521725 (2009-04-01), Nakagawa
patent: 2003/0128907 (2003-07-01), Kikuchi et al.
patent: 2004/0042753 (2004-03-01), Steenblick et al.
patent: 2005/0003104 (2005-01-01), Neumann et al.
patent: 2006/0068122 (2006-03-01), Kanouni et al.
patent: 2290745 (1996-01-01), None
patent: 2001-1661661 (2001-06-01), None
patent: WO 03038141 (2003-05-01), None
W.A. McDonald,Engineered Films for Display Technologies, Journal of Materials Chemistry, vol. 14, p. 4-10, 2004.

Affiliated with

Also associated with

Rating

Photolithographic patterning of polymeric materials does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Photolithographic patterning of polymeric materials, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Photolithographic patterning of polymeric materials will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-2712825