Photolithographic method using exposure system for...

Details Photolithographic method using exposure system for... Photolithographic method using exposure system for...

2005-12-16

2008-08-05

Rutledge, Della J. (Department: 2851)

Photocopying

Projection printing and copying cameras

Step and repeat

C355S077000

Reexamination Certificate

active

07408619

ABSTRACT:
An exposure system for adjusting the critical dimension difference between vertical patterns and horizontal patterns includes a light source for generating a light beam having a predetermined wavelength, a lens for transforming the shape of the light beam generated from the light source into an elliptical shape extended vertically or horizontally, and a lens system for projecting the elliptical light beam passed through the lens onto a wafer through a recticle.

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patent: 6876437 (2005-04-01), Kawahara
patent: 6958803 (2005-10-01), Sasaya et al.
patent: 09-159909 (1997-06-01), None
patent: 10-1998-0018569 (1998-06-01), None
patent: 2001-0054399 (2001-07-01), None
patent: 10-2002-0077263 (2002-10-01), None

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