Photolithographic method of aligning a structure on the back of

Details Photolithographic method of aligning a structure on the back of Photolithographic method of aligning a structure on the back of

1987-06-30

1989-04-04

Hearn, Brian E.

Fishing, trapping, and vermin destroying

437 90, 437183, 437249, 437924, 437948, 437 86, 156656, 1566591, 357 55, 357 68, 148DIG102, H01L 2130

Patent

active

048187240

ABSTRACT:
A method of making semiconductive developments, especially MESFETs, which applies a template to a surface of the substrate previously formed with circuit elements in alignment with these elements and so bonds the template to the substrate that the template can be utilized as a holder for the substrate. The rear surface is then coated with a resist and a second template aligned externally with the first utilizing markings exterior to the substrate to form the structure on the rear surface which can include throughholes for a metal deposit extending through the preferably GaAs substrate.

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patent: 4669175 (1987-06-01), Ray
patent: 4727047 (1988-02-01), Bozler et al.

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