Photolithographic method for high resolution circle patterning u

Details Photolithographic method for high resolution circle patterning u Photolithographic method for high resolution circle patterning u

1995-10-23

1998-07-07

Young, Christopher G.

Radiation imagery chemistry: process, composition, or product th

Micrography, process, composition, or product other than...

430 5, 430 6, 430324, 430326, 430327, G03C 500

Patent

active

057766444

ABSTRACT:
A photolithographic method for patterning small diameter circles at a high resolution on a layer, comprises the steps of depositing a resist layer on said layer; depositing calibrated microspheres, opaque to a radiation, on the surface of the resist layer; and irradiating said resist layer with said radiation.

REFERENCES:
patent: 4668080 (1987-05-01), Gale et al.
Patent Abstracts of Japan, vol. 7, No. 30, p. 173, & JP-A-57 181549, 9 Nov. 1982.
Patent Abstracts of Japan, vol. 7, No. 75, p. 187, & JP-A-58 004148 1 Nov. 1983.

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