Photolithographic mask repair system

Details Photolithographic mask repair system Photolithographic mask repair system

1986-10-17

1988-10-18

Lusignan, Michael

Coating processes

Electrical product produced

Welding electrode

2191216, 21912185, 21912176, 21912183, 427140, 427142, 430 5, 430945, B05D 306, B32B 3500, B23K 900

Patent

active

047786930

ABSTRACT:
A method and device are provided to accomplish laser driven pyrolytic, photolytic and photoactivativation process requiring controlled atmosphere without the use of gas tight cells.
A method and device are provided to correct clear faults on a photo-lithographic mask by metallic deposition on the mask at standard temperature and pressure. The deposition is formed by the pyrolytic decomposition of an organometallic gas mixture which may include chromium and molybdenum hexacarbonyls, and a buffer gas. The decomposition is done utilizing a laser beam. The device may be incorporated into a system which has other members used to correct opaque faults in the same mask.

REFERENCES:
patent: 4543270 (1985-09-01), Oprysko et al.
patent: 4573465 (1986-03-01), Sugiyana et al.
patent: 4609566 (1986-09-01), Hongo et al.
patent: 4636403 (1987-01-01), Fisanick et al.
patent: 4655590 (1987-04-01), Aagano et al.

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