Photolithographic mask fabrication

Details Photolithographic mask fabrication Photolithographic mask fabrication

2001-10-30

2003-09-30

Rosasco, S. (Department: 1756)

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

Reexamination Certificate

active

06627362

ABSTRACT:

TECHNICAL FIELD
This invention relates to fabrication of photolithographic masks for semiconductor processing.
BACKGROUND
Photolithography uses an imaging system that directs radiation onto a patterned mask to form an image that then is projected onto a semiconductor wafer covered with light-sensitive photoresist.


REFERENCES:
patent: 5935737 (1999-08-01), Yan
patent: 6235434 (2001-05-01), Sweeney et al.
Scongtac Jeong et al.; Actinic detection of EUVL mask blank defects; Sep. 1998; Part of the BACUS Symposium on Photomask Technology and Management, SPIE vol. 3546, pp. 524-530.

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