Photolithographic mask

Details Photolithographic mask Photolithographic mask

2006-07-18

2006-07-18

Young, Christopher G. (Department: 1756)

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

C430S030000

Reexamination Certificate

active

07078133

ABSTRACT:
A photolithographic mask has the advantage that a combination of dummy structures, whose pattern is imaged into the resist layer, and auxiliary structures, whose pattern is not imaged into the resist layer, makes it possible to achieve a significant improvement in the imaging properties of the main structures which are disposed at an edge of a region containing a multiplicity of main structures. In particular, constrictions at the structures can be significantly reduced or completely avoided and/or a so-called “tilting” of the structures under non-optimum focus conditions is significantly reduced or completely avoided.

REFERENCES:
patent: 6001512 (1999-12-01), Tzu et al.
patent: 6022644 (2000-02-01), Lin et al.
patent: 6294295 (2001-09-01), Lin et al.
patent: 2002/0006554 (2002-01-01), Fischer et al.
patent: 100 21 096 (2001-10-01), None
patent: 1 174 764 (2002-01-01), None

Affiliated with

Also associated with

Rating

Photolithographic mask does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Photolithographic mask, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Photolithographic mask will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-3575080