Photolithographic fabrication of luminescent images on porous si

Chemistry: electrical and wave energy – Processes and products – Electrostatic field or electrical discharge

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20412965, 20412975, 20412995, C25F 312

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active

053186761

ABSTRACT:
A polished wafer of single-crystal silicon (Si) is ohmically contacted on its backside to a copper wire to provide a working electrode. The wafer and a counterelectrode are immersed in a solution of aqueous HF and ethanol within an optical quality cuvette. Lithographic images are projected onto the silicon wafer within the solution, and the wafer is etched galvanostatically at a low current density until a predetermined charge density is attained. The areas of an n-type silicon wafer exposed to the light during the etch will exhibit visible luminescence when the wafer is illuminated with an ultraviolet (UV) lamp or other short wavelength visible light. The areas of the wafer that were not exposed to the pattern during etch will not luminesce.

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Photolithographic Fabrication of Micron-Dimension Porous Si Structures Exhibiting Visible Luminescence; Vincent V. Doan, et al.; Appl. Phys. Lett. 60(5), Feb. 3, 1992; pp. 619-620.
Luminescent Color Image Generation on Porous Silicon; Vincent V. Doan, et al.; Science, vol. 256; Jun. 26, 1992; pp. 1791-1792.

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