Photolithographic exposure apparatus with multiple alignment mod

Details Photolithographic exposure apparatus with multiple alignment mod Photolithographic exposure apparatus with multiple alignment mod

1989-03-03

1991-01-01

Hix, L. T.

Photocopying

Projection printing and copying cameras

Step and repeat

355 46, 355 54, G03B 2742

Patent

active

049822276

ABSTRACT:
An exposure apparatus in an exposure operation involving image composing or photocomposing, adapts an alignment method for defining the actual positions of all the shot areas on a wafer by sample alignment prior to the exposure operation. It is assumed that a substrate, such as a wafer, is provided with regularly positioned plural image transfer areas each of which is divided into at least two partial areas, and the apparatus executes superimposed exposures with different of the same patterns respectively by a step-and-repeat or step-and-scan-method.

REFERENCES:
patent: 4385838 (1983-05-01), Nakazawa et al.
patent: 4659226 (1987-04-01), Elabd
patent: 4748478 (1988-05-01), Suwa et al.
patent: 4780617 (1988-10-01), Umatate et al.

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