Photoimageable compositions comprising multiple arylsulfonium ph

Details Photoimageable compositions comprising multiple arylsulfonium ph Photoimageable compositions comprising multiple arylsulfonium ph

1996-01-24

1998-03-24

Berman, Susan W.

Synthetic resins or natural rubbers -- part of the class 520 ser

Synthetic resins

Compositions to be polymerized by wave energy wherein said...

522154, 522 25, 427510, 4302701, C08F 250, G03F 7004

Patent

active

057313644

ABSTRACT:
The invention provides positive- and negative-acting a photoresist compositions that contain a photoacid generator component that includes multiple aryl sulfonium compounds. Specifically, the photoactive component contains at least one multiple cation aryl sulfonium compound, preferably a di-cation compound. The photoactive component of the resists of the invention can be conveniently prepared and provide a deep UV sensitive resist with excellent microlithographic properties.

REFERENCES:
patent: 4450360 (1984-05-01), Crivello et al.
patent: 4689289 (1987-08-01), Crivello
patent: 4821050 (1989-04-01), Yabe et al.
patent: 5089374 (1992-02-01), Saeva
patent: 5318876 (1994-06-01), Schwalm et al.
Watt et al, "A Novel Photoinitiator of Cationic Polymerization: Preparation and Characterization of of Polymer Science: Polymer Chemistry Edition. vol. 22, 1789-1796, 1984.

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