Photohardenable composition

Details Photohardenable composition Photohardenable composition

1979-06-27

1980-10-14

Danison, Walter C.

Chemistry: electrical and wave energy

Processes and products

Processes of treating materials by wave energy

20415915, 20415916, 20415917, 20415918, 20415919, 430285, 430286, 430325, C08F 250, C08F 254, C08F 400

Patent

active

042279780

ABSTRACT:
Photohardenable compositions are described comprising a halogenated oligomeric ester, acrylate or methacrylate monomer compatible with the ester, free-radical generating initiator, epoxide, and cationic initiator. The compositions are particularly useful as plating and etching resists.

REFERENCES:
patent: 4069055 (1978-01-01), Crivello
patent: 4085018 (1978-04-01), Ariga et al.
patent: 4090936 (1978-05-01), Barton
patent: 4134811 (1979-01-01), DePoortere
patent: 4134814 (1979-01-01), DePoortere

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