Radiation imagery chemistry: process – composition – or product th – Radiation modifying product or process of making – Radiation mask
Patent
1985-12-23
1987-04-07
Bowers, Jr., Charles L.
Radiation imagery chemistry: process, composition, or product th
Radiation modifying product or process of making
Radiation mask
430 23, 430 24, 430950, 430961, G03F 100
Patent
active
046561072
ABSTRACT:
A method for exposing a layer of photoresist on a sheet includes positioning the sheet in a vacuum printing frame comprising a glass plate carrying an opaque master pattern of metal or metal oxide. With the pattern opposite the coating, the frame is evacuated and the layer is exposed. The pattern has a substantially-uniform thickness in the range of about 0.5.+-.0.2 micrometer. To reduce the times for evacuating and devacuating the frame, the pattern side of the glass plate carries an array of light-transparent islands up to about 3.0-micrometer thick. An overcoating of wax on the islands is a further aid.
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Michielutti Thomas J.
Moscony John J.
Wetzel Charles M.
Bowers Jr. Charles L.
Coughlin Jr. Vincent J.
Irlbeck Dennis H.
RCA Corporation
Whitacre Eugene M.
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