Radiation imagery chemistry: process – composition – or product th – Color imaging process – Using identified radiation sensitive composition in the...
Patent
1985-07-17
1986-09-16
Schilling, Richard L.
Radiation imagery chemistry: process, composition, or product th
Color imaging process
Using identified radiation sensitive composition in the...
430548, G03C 140, G03C 732
Patent
active
046122788
ABSTRACT:
Photographic silver halide materials comprise a polymeric coupler which is at least a copolymer having a repeating unit (A) which comprises at least one coupler moiety (COUP) capable of forming a dye upon coupling with an oxidized color developing agent and at least one repeating unit (B) which is derived from a monomer which is an alkoxyalkylacrylate. The polymeric coupler optionally comprises at least one repeating unit (C) derived from such monomers as those useful for repeating unit (A), those useful for repeating unit (B) and other monomers which can be selected to provide useful physical and chemical properties. The photographic material comprising such a polymeric coupler upon exposure and processing enables formation of a dye image having increased dye density.
REFERENCES:
patent: 3370952 (1968-02-01), Dawson
patent: 3926436 (1975-12-01), Monbaliu et al.
patent: 4080211 (1978-03-01), Paesschen et al.
patent: 4388404 (1983-06-01), Morigaki et al.
patent: 4411987 (1983-10-01), Kobayashi et al.
patent: 4474870 (1984-10-01), Yagihara et al.
Research Disclosure, Dec. 1978, Item No. 17643.
Lau Philip
Tang Ping W.
Eastman Kodak Company
Knapp Richard E.
Schilling Richard L.
LandOfFree
Photographic materials and process comprising polymeric couplers does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Photographic materials and process comprising polymeric couplers, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Photographic materials and process comprising polymeric couplers will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-1995493