Photographic light-sensitive materials

Radiation imagery chemistry: process – composition – or product th – Radiation sensitive product – Identified backing or protective layer containing

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430527, 430961, G03C 178

Patent

active

044181418

ABSTRACT:
A photographic light-sensitive material having improved antistatic properties is described, comprising a plastic support, at least one photographic light-sensitive emulsion layer on one side of the support, and an antistatic layer on the other side of the support, wherein the antistatic layer contains fine particles of at least one crystalline metal oxide selected from ZnO, TiO.sub.2, SnO.sub.2, Al.sub.2 O.sub.3, In.sub.2 O.sub.3, SiO.sub.2, MgO, BaO, and MoO.sub.3, or a composite oxide thereof.

REFERENCES:
patent: 3245833 (1966-04-01), Trevoy
patent: 3503743 (1970-03-01), Kosar
patent: 3874879 (1975-04-01), Rasch
patent: 4078935 (1978-03-01), Nakagiri et al.
patent: 4264707 (1981-04-01), Uozumi et al.
patent: 4267266 (1981-05-01), Shibue et al.

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