Photographic light-sensitive material

Details Photographic light-sensitive material Photographic light-sensitive material

1985-04-22

1986-07-15

Brammer, Jack P.

Radiation imagery chemistry: process, composition, or product th

Radiation sensitive product

Identified backing or protective layer containing

430518, 430523, 430527, 430539, 430621, 430629, 430631, 430636, G03C 176, G03C 186

Patent

active

046006877

ABSTRACT:
A photographic light-sensitive material having at least one layer containing a polymer having a repeating unit of the formula (I): ##STR1## wherein A is a monomer unit prepared by copolymerizing copolymerizable ethylenically unsaturated monomers; R.sub.1 is hydrogen or a lower alkyl group having 1 to 6 carbon atoms; Q is ##STR2## (wherein R.sub.1 is the same as defined above) or an arylene group having 6 to 10 carbon atoms; L is a divalent group having 3 to 15 carbon atoms and containing at least one linking group selected from the members consisting of ##STR3## (wherein R.sub.1 is the same as defined above) or a divalent group having 1 to 12 carbon atoms and containing at least one linking group selected from the members consisting of ##STR4## (wherein R.sub.1 is the same as defined above); R.sub.2 is --CH.dbd.CH.sub.2 or --CH.sub.2 CH.sub.2 X (wherein X is a group capable of being substituted with a nucleophilic group or a group capable of being released in the form of HX upon a base; and x and y each represents molar percent, x being between 0 and 99 and y being between 1 and 100. The polymer has a vinylsulfone group or a functional group which is a precursor of a vinylsulfone group fixed in a specific layer of the photographic light-sensitive material and can be used as a mordant, an antistatic agent or other various photographic additives.

REFERENCES:
patent: 4161407 (1979-07-01), Campbell
patent: 4193795 (1980-03-01), Campbell

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