Radiation imagery chemistry: process – composition – or product th – Radiation sensitive product – Structurally defined
Patent
1992-10-30
1994-02-22
Bowers, Jr., Charles L.
Radiation imagery chemistry: process, composition, or product th
Radiation sensitive product
Structurally defined
430523, 430539, 430536, 430531, 430627, 430628, 430950, 430961, G03C 1815
Patent
active
052885984
ABSTRACT:
Photographic elements containing at least one layer containing polymeric particles surrounded by a layer of colloidal inorganic particles and separate particles of colloidal silica.
REFERENCES:
patent: 2932629 (1960-04-01), Wiley
patent: 2976250 (1961-03-01), Walford
patent: 3206312 (1965-09-01), Sterman et al.
patent: 3411907 (1968-11-01), Whitmore et al.
patent: 3428451 (1969-02-01), Trevoy
patent: 3920456 (1975-11-01), Nittel et al.
patent: 4022622 (1977-05-01), Timmerman et al.
patent: 4148741 (1979-04-01), Bayley
patent: 4203769 (1980-05-01), Guestaux
patent: 4232117 (1980-11-01), Naoi et al.
patent: 4232117 (1980-11-01), Naoi et al.
patent: 4235959 (1980-11-01), Thijs et al.
patent: 4264707 (1981-04-01), Uozumi et al.
patent: 4264719 (1981-04-01), Kameoka et al.
patent: 4275103 (1981-06-01), Tsubusaki et al.
patent: 4394441 (1983-07-01), Kawaguchi et al.
patent: 4396706 (1983-08-01), Ishii et al.
patent: 4409322 (1983-10-01), Ezaki et al.
patent: 4495276 (1985-01-01), Takimoto et al.
patent: 4524131 (1985-06-01), Himmelmann et al.
patent: 4833060 (1989-05-01), Nair et al.
patent: 4833060 (1989-05-01), Nair et al.
patent: 4857443 (1989-08-01), Aono et al.
patent: 4868088 (1989-09-01), Aono et al.
patent: 4885219 (1989-12-01), Miller
patent: 4914012 (1990-04-01), Kawai
patent: 4975363 (1990-12-01), Cavallo et al.
patent: 4980267 (1990-12-01), Taber
patent: 4999276 (1991-03-01), Kuwabara et al.
patent: 5057407 (1991-10-01), Okamura et al.
Research Disclosure 17643, Dec. 1978.
Research Disclosure 22534, Jan. 1983.
Fant Alfred B.
Kestner Melvin M.
Smith Dennis E.
Sterman Melvin D.
Visconte Gary W.
Bowers Jr. Charles L.
Eastman Kodak Company
Gerlach Robert A.
Neville Thomas R.
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