Radiation imagery chemistry: process – composition – or product th – Radiation sensitive product – Identified radiation sensitive composition with color...
Patent
1995-10-05
1996-10-22
Schilling, Richard L.
Radiation imagery chemistry: process, composition, or product th
Radiation sensitive product
Identified radiation sensitive composition with color...
430564, 430566, 430955, 430957, 430959, G03C 7305, G03C 1295, G03C 134, G03C 142
Patent
active
055675778
ABSTRACT:
A photographic element comprising a support having located thereon at least one silver halide emulsion layer, the element containing a release compound that provides a non-imagewise distribution of a photographically active moiety, the release compound comprising a blocking group from which the photographically active moiety is released, the release compound further comprising a ballasting group other than a coupler moiety, and an aqueous solubilizing group, both the ballasting group and the aqueous solubilizing group being attached to the blocking group.
REFERENCES:
patent: 3674478 (1972-07-01), Grasshoff et al.
patent: 4248962 (1981-02-01), Lau
patent: 4409323 (1983-10-01), Sato et al.
patent: 4684604 (1987-08-01), Harder
patent: 4775610 (1988-10-01), Kitaguchi et al.
patent: 5034311 (1991-07-01), Slusarek et al.
patent: 5084376 (1992-01-01), Suda et al.
patent: 5116717 (1992-05-01), Matsushita et al.
patent: 5118596 (1992-06-01), Matushita et al.
patent: 5240821 (1993-08-01), Texter et al.
patent: 5283162 (1994-02-01), Kapp et al.
patent: 5354650 (1994-10-01), Southby
Chen Keath T.
Dickinson David A.
Welter Thomas R.
Eastman Kodak Company
Roberts Sarah Meeks
Schilling Richard L.
LandOfFree
Photographic elements containing release compounds does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Photographic elements containing release compounds, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Photographic elements containing release compounds will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-2357920