Radiation imagery chemistry: process – composition – or product th – Radiation sensitive product – Identified radiation sensitive composition with color...
Patent
1998-12-31
2000-09-19
Letscher, Geraldine
Radiation imagery chemistry: process, composition, or product th
Radiation sensitive product
Identified radiation sensitive composition with color...
430546, 430551, 430631, 430552, 430553, 430554, 430555, 430556, 430557, 430558, G03C 108, G03C 726, G03C 732
Patent
active
061209813
ABSTRACT:
Disclosed is a photographic element comprising a light-sensitive silver halide emulsion layer having associated therewith a dye-foaming coupler compound and a sulfonamido compound (a) bearing on the sulfur atom of the sulfonamido group an alkyl group and (b) bearing on the nitrogen atom of the sulfonamido group both a hydrogen atom that exhibits a pKa value of less than 9 and a second substituent that is either (1) an aryl group containing one or more electron withdrawing substituents for which the sum of the Hammett's values (.SIGMA..sigma..sub.p) is greater than 0.5, or (2) a heteroaryl group.
REFERENCES:
patent: 4840877 (1989-06-01), Abe et al.
patent: 4973535 (1990-11-01), Merkel et al.
patent: 5120636 (1992-06-01), Takahashi et al.
patent: 5382500 (1995-01-01), Sugita et al.
patent: 6004736 (1999-12-01), Taguchi et al.
Dockery Kevin P.
Hoke David
Mooberry Jared B.
Southby David T.
Yahn Kathleen M.
Eastman Kodak Company
Kluegel Arthur E.
Letscher Geraldine
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