Radiation imagery chemistry: process – composition – or product th – Radiation sensitive product – Identified backing or protective layer containing
Patent
1997-09-05
1999-01-19
Schilling, Richard L.
Radiation imagery chemistry: process, composition, or product th
Radiation sensitive product
Identified backing or protective layer containing
430212, 430215, 430531, 430536, 428420, 4284766, 4284784, G03C 1795, G03C 193, G03C 852
Patent
active
058612378
ABSTRACT:
A photographic element is disclosed, comprising a support having a gelatin undercoat, having provided thereon an acetylcellulose layer containing from 1.0 to 12.0 wt % of a polymer represented by formula (1) and from 5 to 40 wt % of a compound having at least two isocyanate groups, both based on acetylcellulose contained in the acetylcellulose layer. Also disclosed is a diffusion transfer photographic light-sensitive material comprising a photographic element comprising a support having a gelatin undercoat, having provided thereon an acetylcellulose layer containing from 2.0 to 9.0 wt % of a polymer represented by formula (1) and from 5 to 20 wt % of a compound having at least two isocyanate group, both based on acetylcellulose contained in the acetylcellulose layer.
REFERENCES:
patent: 3793022 (1974-02-01), Land et al.
patent: 3925081 (1975-12-01), Chiklis
patent: 3938999 (1976-02-01), Yoneyama et al.
patent: 4066814 (1978-01-01), Chiklis
patent: 4267262 (1981-05-01), Karino et al.
patent: 4868088 (1989-09-01), Aono et al.
patent: 4916044 (1990-04-01), Tomiyama et al.
Fuji Photo Film Co. , Ltd.
Schilling Richard L.
LandOfFree
Photographic element and diffusion transfer photographic light-s does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Photographic element and diffusion transfer photographic light-s, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Photographic element and diffusion transfer photographic light-s will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-1245619