Radiation imagery chemistry: process – composition – or product th – Radiation sensitive product – Identified backing or protective layer containing
Patent
1996-06-20
1998-05-05
Huff, Mark F.
Radiation imagery chemistry: process, composition, or product th
Radiation sensitive product
Identified backing or protective layer containing
430961, G03C 1106, G03C 176
Patent
active
057472343
ABSTRACT:
A photographic element comprising a support, a light-sensitive layer on one side of the support, and on the other side of the support, at least one backing layer and a protective outermost lubricating layer, the protective layer comprising a solid wax and a non-ionic fluorinated surfactant in an amount less than the surfactant's solubility in the wax, said protective layer being coated from a mixture of an aromatic solvent and at least one lower alkyl alcohol.
REFERENCES:
patent: 3782947 (1974-01-01), Krall
patent: 4279945 (1981-07-01), Audran et al.
patent: 4820615 (1989-04-01), Vandenabeele et al.
patent: 4891307 (1990-01-01), Mukunoki et al.
patent: 4990276 (1991-02-01), Bishop et al.
patent: 5137802 (1992-08-01), Ueda et al.
patent: 5147768 (1992-09-01), Sakakibara
patent: 5217804 (1993-06-01), James et al.
patent: 5229259 (1993-07-01), Yokota
patent: 5382494 (1995-01-01), Kudo et al.
patent: 5395743 (1995-03-01), Brick et al.
patent: 5397826 (1995-03-01), Wexler
patent: 5423050 (1995-06-01), Taylor et al.
patent: 5427900 (1995-06-01), James et al.
patent: 5434037 (1995-07-01), Wexler et al.
patent: 5436120 (1995-07-01), Wexler et al.
patent: 5514528 (1996-05-01), Chen et al.
Decory John Francis
DePalma Vito A.
James Robert Owen
Lobo Lloyd A.
Wexler Ronald Myron
Eastman Kodak Company
Huff Mark F.
Ruoff Carl F.
LandOfFree
Photographic element does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Photographic element, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Photographic element will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-52376