Photoelectron mask and photo cathode image projection method usi

Radiant energy – Irradiation of objects or material – Ion or electron beam irradiation

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H01J 4006

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active

049547178

ABSTRACT:
A photoelectron mask for photo cathode image projection includes a transparent substrate, and a pattern formed on a main surface of the transparent substrate. The pattern includes a non-transparent material. The mask also includes a photoelectron emission film formed so as to cover the main surface of the transparent substrate on which the pattern is formed. The photoelectron emission film includes a material selected from the group consisting of pure platinum, a platinum-rich material containing platinum as the major component, and a platinum compound.

REFERENCES:
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patent: 3843916 (1974-10-01), Trotel et al.
patent: 3867148 (1975-02-01), O'Keefe et al.
patent: 3895234 (1975-07-01), O'Keefe et al.
patent: 4137458 (1979-01-01), King et al.
patent: 4514489 (1985-04-01), Garcia et al.
patent: 4528452 (1985-07-01), Livesay
IEEE Transactions on Electron Devices, vol. ED-22, No. 7, Jul. 1975, "An Electron Image Projector with Automatic Alignment", by Julian P. Scott, pp. 409-413.
IBM Technical Disclosure Bulletin, vol. 25, No. 3A, Aug. 1982, "Proximity Correction in E-Beam Systems", by N. G. Anantha et al., p. 986.

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