Photoelectroforming mandrel and method of electroforming

Chemistry: electrical and wave energy – Processes and products

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204281, C25D 100, C25D 1712

Patent

active

045499390

ABSTRACT:
The present invention relates to an electroforming process and mandrel which utilize a photomask substrate. The process comprises preparing an electroforming mandrel consisting of a photomask substrate, a continuous transparent conductive film on a surface of the substrate, and a discontinuous layer of photoresist which defines a pattern on the surface of the conductive film. A cathodic connector is attached to the conductive film of the electroforming mandrel and anodic connector is attached to an electrode comprising metal to be deposited on the mandrel. The mandrel and the metal electrode are immersed into an electroforming solution and electric current is established through the electrodes and solution. Electrodeposition of the metal is carried out to the desired thickness to electroform the metallic part on the mandrel.

REFERENCES:
patent: 2765230 (1956-10-01), Tinklenberg
patent: 3703450 (1972-11-01), Bakewell
patent: 3833482 (1974-09-01), Jacobus
patent: 3878061 (1975-04-01), Feldstein

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