Photoelectrical conversion device and generating system using th

Active solid-state devices (e.g. – transistors – solid-state diode – Non-single crystal – or recrystallized – semiconductor... – Amorphous semiconductor material

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

257 55, 257 56, 257458, 257656, 136255, 136258, 136261, H01L 2904, H01L 3136, H01L 31376

Patent

active

055634257

ABSTRACT:
An object of the present invention is to provide a photoelectrical conversion device in which recombination of carriers excited by light is prevented and the open voltage and the carrier range of positive holes are improved and to provide a generating system using the photoelectrical conversion device. The photoelectrical conversion device includes a p-layer, an i-layer, and an n-layer, wherein the photoelectrical conversion device being formed by stacking the p-layer, the i-layer and the n-layer each of which is made of non-single-crystal silicon semiconductor, the i-layer contains germanium atoms, the band gap of the i-layer is smoothly changed in a direction of the thickness of the i-layer, the minimum value of the band gap is positioned adjacent to the p-layer from the central position of the i-layer and both of a valence control agent to serve as a donor and another valence control agent to serve as an acceptor are doped into the i-layer. Further, at least either of the p-layer or the n-layer is formed into a stacked structure consisting of a layer mainly composed of group III elements of the periodic table and/or group V elements of the same and a layer containing the valence control agent and mainly composed of silicon atoms.

REFERENCES:
patent: 4398054 (1983-08-01), Madan
patent: 4471155 (1984-09-01), Mohr et al.
patent: 4542256 (1985-09-01), Wiedemann
patent: 4782376 (1988-11-01), Catalano
patent: 4816082 (1989-03-01), Guha et al.
patent: 4954182 (1990-09-01), Ovshinsky et al.
patent: 5104455 (1992-04-01), Yokota et al.
Bragagnolo et al., "Optimum Deposition Conditions . . . System", Conf. Rec. 19th IEEE Photovoltaic Specialists Conf., 1987, pp. 878-883.
Yoshida et al., "Efficiency Improvement in Amorphous-SiGe:H Solar . . . " Conf. Rec. 19th IEEE Photovoltaic Specialists Conf., 1987, pp. 1101-1106.
Hiroe et al., "Stability and Terrestrial Application . . . Cells", Conf. Rec. 19th IEEE Photovoltaic Specialists Conf., 1987, pp. 1111-1116.
Sato et al., "Preparation of High Quality a-SiGe:H Films . . . Cells", Conf. Rec., 19th IEEE Photovoltaic Specialiest Conf., 1988, pp. 73-78.
Guha et al., "A Novel Design for Amorphous Silicon Alloy Solar Cells", Conf. Rec., 20th IEEE Photovoltaic Specialists Conf., 1988, pp. 79-84.
Pawliliewicz et al., "Numerical Modeling of Multijunctions, . . . Cells", Conf. Rec., 20th IEEE Photovoltaic Specialists Conf., 1988, pp. 251-255.
Pawlikiewicz et al., "Numerical Modeling of Multijunction, Amporphous Silicon Based P-I-N Solar Cells," The Conference Record of the Twentieth IEEE Photovoltaic Specialists Conference-1988, vol. I, Las Vegas Nevada, Sep. 26-30, 1988, pp. 251-253.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Photoelectrical conversion device and generating system using th does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Photoelectrical conversion device and generating system using th, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Photoelectrical conversion device and generating system using th will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-59501

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.