Optics: measuring and testing – By alignment in lateral direction – With light detector
Patent
1980-07-31
1983-09-27
Ponter, William H.
Optics: measuring and testing
By alignment in lateral direction
With light detector
G01B 1100
Patent
active
044065469
ABSTRACT:
A photoelectric detecting device reads the alignment mark of a mask and the alignment mark of a wafer with high accuracy. In this device, a photoelectric detecting system for detecting the light reflected from the mask and a photoelectric detecting system for detecting the light reflected from the wafer are provided separately from each other to read the two marks with high accuracy. To distinguish between the light reflected from the mask and the light reflected from the wafer, a .lambda./4 plate is positioned between the mask and the wafer. The device also uses a polarized light beam to illuminate the mask and wafer.
REFERENCES:
patent: 3853398 (1974-12-01), Kano
patent: 3865483 (1975-02-01), Wojcik
patent: 4153371 (1979-05-01), Koizumi et al.
patent: 4251129 (1981-02-01), Suzki et al.
patent: 4315201 (1982-02-01), Suzki et al.
Canon Kabushiki Kaisha
Ponter William H.
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