Photoelasticity determination of a deformation or stress field

Details Photoelasticity determination of a deformation or stress field Photoelasticity determination of a deformation or stress field

1988-02-19

1990-04-03

Rosenberger, Richard A.

Optics: measuring and testing

Material strain analysis

With polarized light

356367, C01B 1118

Patent

active

049144871

ABSTRACT:
A method for photoelasticity examination of a stress or strain field comprises successive steps. A two dimensional image of a test-piece is formed which has isochromatic fringes in the form of an array of pixels and the grey level of each pixel is stored as a digital value. From the isoclinals, the orientation of the main stresses .sigma.I and .sigma.II is determined at each pixel and the angle of orientation is stored for obtaining each pixel; from the stored pixels, the law of variation of brightness is worked out along at least three lines parallel to an arbitrary direction chosen by the operator and passing completely through the test-piece; from a condition at the limits and by finite differences then integration, a value is determined representative of .sigma.I and .sigma.II at each point of the median line among the three lines and .sigma.I and .sigma.II are derived from the stored digital values and from the computed values of .sigma.I and .sigma.II. A device for carrying out the method includes a polarizer and an analyzer whose relative angle may be modified, an imaging system and a computer for carrying out the successive computation steps.

REFERENCES:
patent: 3243819 (1966-03-01), Chapman
patent: 3373652 (1968-03-01), Flader
patent: 4684487 (1987-08-01), Gawrisch

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