Photodiode with ultra-shallow junction for high quantum...

Semiconductor device manufacturing: process – Making regenerative-type switching device – Bidirectional rectifier with control electrode

Reexamination Certificate

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C438S181000

Reexamination Certificate

active

07122408

ABSTRACT:
A pinned photodiode with an ultra-shallow highly-doped surface layer of a first conductivity type and a method of formation are disclosed. The ultra-shallow highly-doped surface layer has a thickness of about 100 Angstroms to about 500 Angstroms and a dopant concentration of about 5×1017atoms per cm3to about 1×1019atoms per cm3. The ultra-shallow highly-doped surface layer is formed by diffusion of ions from a doped layer into the substrate or by a plasma doping process. The ultra-shallow pinned layer is in contact with a charge collection region of a second conductivity type.

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