Photodiode cell structure of photodiode integrated circuit...

Active solid-state devices (e.g. – transistors – solid-state diode – Responsive to non-electrical signal – Electromagnetic or particle radiation

Reexamination Certificate

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Details

C257S463000, C257SE31057, C257SE33046, C438S087000

Reexamination Certificate

active

07936038

ABSTRACT:
Disclosed herein is a photodiode cell, including: a first-type substrate; a second-type epitaxial layer disposed on the first-type substrate; heavily-doped second-type layers, each having a small depth, formed on the second-type epitaxial layer; and heavily-doped first-type layers, each having a narrow and shallow section, disposed on the second-type epitaxial layer and formed between the heavily-doped second-type layers, wherein the first-type and second-type have opposite doped states.

REFERENCES:
patent: 5767538 (1998-06-01), Mullins et al.

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