Photocuring of organopolysiloxanes devoid of Si-H bonds and cont

Details Photocuring of organopolysiloxanes devoid of Si-H bonds and cont Photocuring of organopolysiloxanes devoid of Si-H bonds and cont

1983-06-07

1984-12-04

Morris, Theodore

Chemistry: electrical and wave energy

Processes and products

Processes of treating materials by wave energy

428447, C08F 246, C08F 3008

Patent

active

044862814

ABSTRACT:
An organopolysiloxane composition is facilely photocured, e.g., into a variety of non-stick coatings, by subjecting to a photocross-linking amount of ultraviolet irradiation, admixture of (i) a polysiloxane comprised of hydroxysilyl groups devoid of Si-H bonds and containing no organic radicals which include sites of activated ethylenic unsaturation, and (ii) an aminopolyalkoxysilane.

REFERENCES:
patent: 3627836 (1971-12-01), Getson
patent: 4064027 (1977-12-01), Gant
patent: 4075167 (1978-02-01), Takamizawa
patent: 4191713 (1980-03-01), Yonezawa

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