Chemistry: electrical and wave energy – Processes and products – Processes of treating materials by wave energy
Patent
1980-08-25
1982-11-16
Brammer, Jack P.
Chemistry: electrical and wave energy
Processes and products
Processes of treating materials by wave energy
430286, 430287, 430288, 526279, 528 30, G03C 168, C08G 7700
Patent
active
043593690
ABSTRACT:
The invention provides a novel photocurable organopolysiloxane composition having an unusually high photosensitivity suitable, for example, for providing an anti-sticking layer on a release paper. The composition comprises an organopolysiloxane having, in a molecule, at least one thioacyloxy-containing organosiloxane unit as the photosensitive functional group and a photosensitizer. Further improved photocurable composition of the invention comprises an organopolysiloxane having, in addition to the above mentioned thioacyloxy-containing organosiloxane units, at least one mercaptohydrocarbyl-containing organosiloxane unit in a molecule. Alternatively, photosensitivity of the similar degree is obtained when the composition comprises a first organopolysiloxane having, in a molecule, at least one thioacyloxy-containing organosiloxane unit and a second organopolysiloxane having, in a molecule, at least one mercaptohydrocarbyl-containing organosiloxane unit as combined.
REFERENCES:
patent: 3782940 (1974-01-01), Otto et al.
patent: 4070526 (1978-01-01), Cocquttoun et al.
patent: 4201808 (1980-05-01), Cully et al.
patent: 4262073 (1981-04-01), Pampalone et al.
patent: 4301231 (1981-11-01), Atarashi et al.
Aoki Hsashi
Hara Yasuaki
Inoue Yoshio
Okada Fumio
Takamizawa Minoru
Brammer Jack P.
Shin-Etsu Chemical Co. , Ltd.
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